摘要
一、引言 在金刚石薄膜的制备过程中,人们往往监测成膜过程中的宏观参量,使其工艺的重复性,优选性受到了很大限制。而随着对膜质量和结构的要求越来越高,人们开始开展对低压下合成金刚石机理的研究,但至今未见系统地研究宏观参量与等离子体参量方面的工作报道。
Characteristics of the microwave plasma have been studied using a double probe and emission spectrometer in the macroparameter range within which the diamond films are deposited by the plasma. Therelationship between the plasma parameters and deposition parameters such as the concentration of CH3OH/H2,gas flow rate, microwave power and gas pressure is discussed.Influence of plasma parameters on the film quality has been studied. In-situ diagnostics showed that higher electron temperature is beneficial to diamond film growth.
出处
《核聚变与等离子体物理》
CAS
CSCD
北大核心
1992年第2期124-128,共5页
Nuclear Fusion and Plasma Physics
关键词
淀积
参数
金刚石
薄膜
Diamond film,Plasma parameter, Plasma chemical vapor deposition.
