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影响气相沉积用钽丝性能的因素研究 被引量:1

Study on Influence Factors on Property of Tantalum Wire for Vapor Deposition
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摘要 以不同的冶金级钽粉为原料,通过相同的加工工艺试制成相同规格的钽丝,经过对钽丝产品机械性能、抗氧脆性、抗氢脆性以及表面质量的分析,确定气相沉积用钽丝一定要采用普通钽粉来制取,此外可以通过增大加工率来增加钽丝的抗拉强度。 Applying different metallurgical tantalum powder as raw materials,tantalum wires with the same specifications were prepared by same processing process.It is confirmed that tantalum wires for vapor deposition must be prepared by metallurgical tantalum powder based on the analysis results of mechanical properties,anti-oxygen brittleness,anti-hydrogen brittleness,and surface quality of tantalum wire products.Tensile strength of tantalum wire can be improved by increasing processing rate.
作者 解永旭 周英 秦亮 XIE Yong-xu;ZHOU Ying;QIN Liang(Ningxia Orient Tantalum Industry Co.,Ltd.,Shizuishan 753000,Ningxia,China)
出处 《有色金属(冶炼部分)》 CAS 北大核心 2019年第3期60-63,72,共5页 Nonferrous Metals(Extractive Metallurgy)
基金 国家重点研发计划项目(2017YFB0305404)
关键词 冶金级钽粉 钽丝 机械性能 抗氧脆性 抗氢脆性 metallurgical tantalum powder tantalum wire mechanical property anti-oxygen brittleness anti-hydrogen brittleness
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  • 1Sakamoto Y, Chen F L, Kinari Y. J. Alloys and Comp., 1994,205:205-210.
  • 2Sun Z,Shi J R, Tay B K, et al. UV Raman characteristics of nanocrystalline diamond films with different grain size[J]. Diamond Relat Mater,2000, (9):1979- 1983.
  • 3Leeds S M,Davis T J, May T W, et al. Use of different excitation wavelength for the analysis of CVD diamond by laser Raman spectroscopy[J]. Diamond Relat Mater, 1998, (7):233-237.
  • 4Gruen Dieter M.Nanocrystalline diamond films[J].Annu Rev Mater Sci,1999,29:211-259.
  • 5Sun X S,Wang N, Zhang W J, et al. Synthesis of nanocrystalline diamond by the direct ion beam deposition method[J ]. J Mater Res, 1999,14(8) :3204 - 3207.
  • 6Yoshikawa Hiromichi, Moral Cedric, Koga Yoshinori. Synthesis of nanocrystalline diamond films using microwave plasma CVD[J ]. Diamond and Related Materials,2001, (10):1588- 1591.
  • 7Kapil R, Mehta B R, Vankar V D, et al. Growth of diamond thin films in a cyclic growth-etch oxy-acetylene flame process[J ]. Thin Solid Films, 1998,322( 1 - 2): 74 - 84.
  • 8朱正和,刘幼成,王红艳,蒋刚,谭明亮,武胜,蒋国强,罗德礼.金属镍吸附氢同位素的量子力学计算[J].原子与分子物理学报,1998,15(4):435-443. 被引量:25
  • 9犬冢直夫,王景义.金刚石薄膜的新合成方法[J].微细加工技术,1990(2):41-46. 被引量:2
  • 10罗德礼,孙颖,刘晓亚,蒋刚,蒙大桥,朱正和.UH和UH_2分子的结构与势能函数[J].物理学报,2001,50(10):1896-1901. 被引量:55

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