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用局域寿命控制技术改善功率快恢复二极管性能的仿真研究 被引量:4

Simulation of Power Fast Recovery Diodes Using Local Lifetime Controlling Technique
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摘要 针对局域低寿命区的参数对快恢复硅功率二极管性能的影响进行了系统的仿真研究 ,得到了全面系统的研究结果 ,其中包括局域低寿命区在二极管中的位置不同和局域低寿命区中复合中心能级在禁带中的位置不同对快恢复二极管的反向恢复时间 ( trr)、反向恢复软度因子 ( S)、正向压降 ( VF)、漏电流 ( IR)等各个单项性能的影响 ,以及对 trr- S、trr- VF 和 trr- IR 等各项性能综合折衷的影响 .这些结果对高速功率器件寿命工程研究和器件制造工程都有重要的参考价值 . The influence of parameters of the local low-lifetime region on the performance of fast recovery silicon power diodes is simulated.Comprehensive and systematic results are obtained,including the influence of different locations of the low-lifetime region in the diode and the different locations of the recombination center level in the energy gap on the following separate factors:reverse recovery time (t rr),reverse recovery softness factor (S),forward voltage drop (V F),and high temperature leakage current (I R).Furthermore,the influence of the parameters of the local low-lifetime region on the tradeoff between t rr and S,t rr and V F,trr and I R is also studied.These results have an important reference value on the research of the lifetime engineering for high-speed power device and device manufacture engineering.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第5期520-527,共8页 半导体学报(英文版)
基金 北京市自然科学基金 (批准号 :40 2 2 0 0 4) 北京市教委 (批准号 :2 0 0 2 KG0 0 9)资助项目~~
关键词 局域寿命控制 快恢复硅功率二极管 参数折衷 轴向位置 复合中心能级位置 local lifetime control tradeoff axis location location of recombination center level in energy gap
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参考文献10

  • 1[1]Hazdra P,Vobecky J,Galster N,et al.A new degree of freedom in diode optimization:arbitrary axial lifetime profiles by means of ion irradiation.Proceedings ISPSD'2000,2000:123
  • 2[2]Silber D,Nowak W K,Wondrak S.Improved dynamic properties of GTO-thyristors and diodes by proton implantation.IEDM 85,1985:162
  • 3[3]Hazdra P,Brand K,Rubes J,et al.Local lifetime control by light ion irradiation:impact on blocking capability of power P-i-N diode.Microelectron J,2001,32:449
  • 4[4]Napoli E,Strollo A G,Spirito P.Numerical analysis of local control for high-speed low-loss P-i-N diode design.IEEE Trans Power Electron,1999,14(4):615
  • 5[5]Vobecky J,Hazdra P,Homola J.Optimization of power diode characteristics by means of ion irradiation.IEEE Trans Electron Devices,1996,43(12):2283
  • 6[6]Hazdra P,Vobecky J.Accurate simulation of fast ion irrated power devices.Solid-State Electron,1994,37(1):127
  • 7[7]Hazdra P,Vobecky J,Brand K.Optimum lifetime structure in silicon power diodes by means of various irradiation techniques.Nuclear Instruments and Methods in Physics Research B,2002,186:414
  • 8[8]Jayant B B.Modern power devices.John Wiley & Sons,Inc,1987
  • 9[9]Lorenz L.Trends in power integration state-of-the art and future.International Conference on Power Electronics 2002 (PCIM Shanghai),2002:1
  • 10[10]MEDICI User Guide.Technology Modeling Associates,Inc.,Palo Alto,CA,1993

同被引文献24

  • 1Temple V A K,Holroyd F W.Optimizing carrier lifetime profile for improved trade-off between turn-off time and forward drop.IEEE Trans Electron Devices,1983,30(7):782.?A?A?A
  • 2Vobecky J,Hazdra P,Homola J.Optimization of power diode characteristics by means of ion irradiation.IEEE Trans Electron Devices,1996,43(12):2283.
  • 3Napoli E,Srollo A G M,Spirito P.Numerical analysis of local lifetime control for high-speed low-loss P-i-N diode design.IEEE Trans Power Electron,1999,14(4):615.
  • 4Sze S M.Physics of semiconductor devices.2nd Edition.New York:John Wiley,1981.
  • 5Baliga B J,Sun E.Comparison of gold,platinum,and electron irradiation for controlling lifetime in power rectifiers.IEEE Trans Electron Devices,1977,24(6):685.
  • 6Pals J A.Properties of Au,Pt,Pd,and Rh levels in silicon measured with a constant capacitance technique.Solid-State Electron,1974,17:1139.
  • 7Miller M D,Schade H,Nuese C J.Lifetime-controlling recombination centers in platinum-diffused silicon.J Appl Phys,1976,47(6):2569.
  • 8Kwon Y K,Ishikawa T,Kuwano H.Properties of platinum associated deep levels in silicon.J Appl Phys,1987,61(3):1055.
  • 9Valdinoci M,Colalongo L,Pellegrini A,et al.Analysis of conductivity degradation in gold/platinum-doped silicon.IEEE Trans Electron Devices,1996,43(12):2269.
  • 10Arora N D,Hauser J R,Roulston D J.Electron and hole mobilities in silicon as a function of concentration and temperature.IEEE Trans Electron Devices,1982,29(2):292.

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