中频反应磁控溅射TiO_2薄膜对敌敌畏的光催化降解性能

DDVP Photocatalytic Degradation of TiO_2 Films Grownby Mid-Frequency Reactive Magnetron Sputtering

作者利用中频反应磁控溅射技术制备了厚度低于 4 0 0nm的TiO2 薄膜 ,并对其在紫外线作用下对敌敌畏 (DDVP)的光催化降解性能进行了系统的研究。实验结果显示 :敌敌畏的降解速率与光照时间和紫外辐照强度成正比 ,在TiO2 薄膜催化下 ,12 5W紫外灯辐照 4h后降解率可达 97%。 30 0℃下退火处理有利于提高薄膜的催化能力。

DDVP photocatalytic degradation of TiO 2 films,grown by mid frequency alternative reactive magnetron sputtering,was systematically studied.The results show that the DDVP degradation rate is roughly proportional to the intensity and irradiation time of the ultra violet (UV) light.97 percent of DDVP could be degraded by TiO 2 film under the irradition of a 125 W UV lamp for 4 h.Annealing the film at 300 ℃ and an increase of the film thickness may favorably improve its photocatalytic degradation capability.