用GXRD和XPS分析离子注入层的表面结构

ANALYSIS OF SURFACE MICROSTRUCTURE OF ION IMPLANTATION LAYER BY GXRD AND XPS

采用由金属蒸气真空弧 (MEVVA)离子源引出的强束流脉冲钨离子对H13钢进行了离子注入表面改性研究。借助掠面X射线衍射 (GXRD)和X射线光电子能谱 (XPS)考察了注入表面层的相结构以及钨、铁、碳的化学状态。研究发现 ,表面的含碳化钨层比含铁、钨氧化层要厚 ,离子注入层中钨元素以替位钨和三氧化钨形式存在 ,铁元素以金属铁和三氧化二铁形式出现 。

A study of the surface modification of H13 steel by ion implanation was performed by using a high flux pulse tungsten ion beam (energy of implanation was between 30~150keV) extracted from MEVVA ion source. The acceleration voltage of tungsten ion was 30kV. In the implantation, the density of the pulse beam flux was 300μA·cm -2 at maximum, the width of the pulse beam was 900ms, with a frequency of 25Hz, and average ion beam flux density was 15μA·cm -2 . Observations of the phase structure and chemical states of the elements (W、 Fe and C) were carried out by GXRD and XPS. As shown by the experimental results, on the surface of the H13 steel the tungsten carbide layer was found to be thicker than the layer of oxides of iron and tungsten; tungsten element in the ion implanted layer was found to be present as substitute and as tungsten trioxide; the element iron was present as iron metal and iron trioxide; and the atomic ratio of elements in different valency changed with the change of depth.