纳米器件的一种新制造工艺——纳米压印术

A new technique for fabrication of nanodevices-nanoimprint lithography

纳米压印术可以用于大批量重复性地制备纳米图形结构。此项技术具有操作简单、分辨率高、重复性好、费时少,成本费用极低等优点。本文介绍了较早出现的软刻印术的两种方法———微接触印刷法和毛细管微模制法。详细讲述了纳米压印术(主要指热压雕版压印法)的各步工序———压模制备、压印过程和图形转移,以及用于压印的设备、纳米图案所达到的精确度等,还简述了纳米压印术的另一方法———步进-闪光压印法。最后,通过范例介绍了纳米压印术在制作电子器件、CD存储器和磁存储器、光电器件和光学器件、生物芯片和微流体器件等方面的应用。

Nanoimprint lithography(NIL)can be used as a new technique for mass production of nanometer-scaled features.This technique has many advantages such as easy operation,high reso-lution,high repetition,low man-hour ,and low cost etc.This paper gives a brief review of two methods of soft lithogra phy-microcontact printing and micromolding in capillaries.It narrats the working procedures of NIL(mainly pointing hot-embossing lithography)-fabrication of mold,imprint process,pattern transfer,equipment for nanoimprint and pattern precision etc.It also discusses another method of NIL-step-and-flash lithography.At last,it shows some applied ex-amples of NIL in fabrication of electronic devices,data storage,photodetectors and light emit-ters,biochips and micro-fluid devices.