有限元方法求解化学气相淀积反应器模型(Ⅰ)——冷壁反应器模型及有限元解

NUMERICAL ANALYSIS OF CHEMICAL VAPOR DEPOSITION REACTORS ( I ) ANALYSIS OF CVD OF TiN COATING IN A COLD-WALL REACTOR

建立了冷壁化学气相淀积反应器的数学模型,用Galerkin有限元方法对模型予以求解.计算中考虑了温度对物性参数的影响及自然对流因素,计算值和实验结果基本上一致.

The fluid flow, heat transfer and mass transfer are incorporated in a two-dimensional model of an axisymmetric reactor. The problem is solved numerically by Galerkin finite element method, using a velocity-pressure formulation for the N-S equations. The dependence of density, viscosity, thermal conductivity and diffusion coefficient on temperature are considered and the presence of free convection is simulated rather well. The distributions of velocity, temperature, TiCl4 concentration in the reactor and the deposition rate of TiN on the substrate are predicted. The computational results are in good agreement with experimental data.