大规模集成电路对所用化学试剂和高纯水的要求

Requirements of VLSI for ultrapure water and chemicals

介绍了大规模集成电路对所用化学试剂和高纯水的要求。如快扩散杂质、碱金属、细菌、二氧化硅、总有机碳及颗粒等。对高纯水和化学试剂中不同的杂质在集成电路中的影响进行了讨论,并给出了高纯水的国家标准和国外对256K 至4M DRAM 用水质量的规格。

The requirements of VLSI for quality of ultrapure water and chemicals including fast-diffusing impurities,alkali metals,bacteria,silica,TOC(total organic carbon)and particles,arediscussed.The effect of various impurities inultrapure water and chemicals on IC fabricationis also studied.The state standards for ultra-pure water and the specifications for 256K to 4MDRAM have been given.