计算机控制光学表面抛光的磨头运动方式和参数的优化研究

Studying and optimizing running mode and parameter of polishing tool used in computer controlled polishing of optical surface

对影响计算机数控抛光表面误差收敛速度的主要因素———磨头工作函数进行了详细的讨论。提出了以趋近因子作为评价磨头参数优化的参量。对目前流行的行星式磨头和平转动磨头分别作优化,给出了最佳参数组合,为提高计算机控制抛光的效率提供了理论依据。

The working function of polishing tool was discussed, and it influences the error constringency velocity of polishing surface by numerical controlling. The tending gene is put forward to be the optimizing parameter to estimate the parameters of polishing tool. The parameters of polishing tool was optimized in the two popular running mode: planet movement and smooth running, and the best combination of the tool parameters were given. The theory bases for improving computer controlled polishing efficiency were offered.