期刊文献+

三价铬电镀的研究与发展 被引量:19

Research and Development of Trivalent Chromium Plating
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摘要 综述了国外三价铬装饰性电镀的专利及近几年三价铬功能性镀厚铬研究的动态。回顾了三价铬电镀发展的历程、取得的成果以及今后发展的趋势 ,并希望国内的研究者加快步伐 。 The decorative and hard functional trivalent chromium plating patents and papers abroad are reviewed. While discussing the history, achievement and development of trivalent chromium plating, the authors ask the domestic researchers to try their best to accelerate the application of the trivalent chromium plating process in China.
出处 《表面技术》 EI CAS CSCD 北大核心 2003年第3期5-7,18,共4页 Surface Technology
关键词 三价铬电镀 装饰性镀层 功能性镀层 Trivalent chromium plating Decorative deposit Functional deposits
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参考文献31

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二级参考文献15

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