pH值对聚四氨基酞菁铜膜电化学性质的影响

Effect of pH on electrochemistrical properties of poly copper tetraaminophthalocyanine film

目的 :研究了 p H值对聚四氨基酞菁铜 (p- Cu TAPc)膜电化学性质的影响。方法 :用循环伏安法在玻碳电极上制备了 p- Cu TAPc膜 ,并用循环伏安法对其在不同酸度下的氧化还原性质进行研究。结果 :发现其氧化还原电位与 p H值存在线性关系 ,斜率为 - 2 8m V/p H。结论 :质子和氢氧根离子参与了氧化还原反应。

Objective: To investigate the effect of pH on the electrochemistrical properties of poly-copper tetraaminophthalocyanine (P-Cu TAPc)film. Method: The p-CuTAPc film was prepared by anodic electroploymerization on glass carbon electrode. The electrochemistry property of the p-CuTAPc film in B-R buffer solution was studied by using CV. Result: The electrochemistry property of the p-CuTAPc film was related to the solution acidity . The redox potentials were found to be pH dependent with a slope of -61 mv/pH. Conclusion: Both H + and OH - participate in the redox reaction of the p-CuTAPc film.