实现工艺映射的新方法

A New Method for Technology Mapping

逻辑综合中,工艺映射是关键的一步。过去,基于树的映射由于其速度快、算法简洁而被广泛使用。但是,将电路结构划分为树,破坏了电路结构,缩小了映射的解空间。双态覆盖(BinateCovering)能充分利用门级网表的结构特性,使工艺映射后的电路具有更好的性能。

Technology mapping is an important step in logic synthesis In the past, treebased mapping was widely used because of its high speed and conciseness However, the circuit structure is destroyed in this method and better implementations are neglected With binate covering, the structural characteristics of the gatelevel netlist can be explored in detail, and the circuit after technology mapping has better performance