摘要
采用溶胶 凝胶法用旋转镀膜工艺在K9玻璃基片上制备出了SiO2和有机硅单层减反膜以及有机硅 SiO2双层减反膜。考察了旋转速度对SiO2和有机硅单层膜的中心透射波长、膜层折射率等基本光学性质的影响,实验确定了双层膜的涂敷工艺。透射光谱测量表明,采用本文工艺条件制备的有机硅 SiO2双层膜在430~800nm范围内透射率达99%以上。
The technique to fabricate a doublelayer broadband antireflective (AR) film by solgel spincoating process for high power lasers was investigated. The doublelayer film was composed of a single SiO2 AR coating with reflective index about 13 and silicone coating with reflective index about 1.4. The experimental result showed, when the physical thickness of silicone film and SiO2 AR film were 112nm and 125nm respectively, the doublelayer AR film can be developed with transmission greater than 99% at the waveband range from 430nm to 800nm, which can meet the optical quality of shield glass for the prototype of ShenguangIII facility.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2003年第7期647-650,共4页
High Power Laser and Particle Beams
基金
国家自然科学基金重点项目资助课题(2013304)
中国工程物理研究院预研基金资助课题(421020607)