摘要
归纳解释了光刻机曝光光学中的若干重要概念,例如分辨率、焦深等,详细地阐述了光刻机曝光的原理。考虑到类似概念在不同系统中的含义差别,进行了针对性的辨析。从物理光学层次了解和掌握光刻机曝光的机理。
Some key concepts,such as the resolution and depth of focus,in the stepper and its exposuring principles are explained and discussed. These concepts have special meanings different from those in physical optics. The differences are distinguished to understand the exposuring mechanism of the stepper better.
出处
《微细加工技术》
2003年第2期29-33,共5页
Microfabrication Technology
