期刊文献+

双光子三维微细加工重要工艺参数的实验研究 被引量:5

Experimental Research for Important Process Parameters of Two-photon Three-dimensional Microfabrication
下载PDF
导出
摘要 优化工艺参数是保证双光子微细加工质量的重要条件。经分析选取了激发光强、覆盖率和物镜的数值孔径作为实验研究对象。用自行开发的双光子微细加工系统,通过单独控制一个加工条件而固定其它条件的方法,对比不同条件下系统的实验结果,探讨该工艺条件对加工质量的影响。最后,给出了经参数优化后的部分实验结果。 Optimization of process parameters is an important condition of twophoton microfabrication. After analyzed,the exciting laser intensity,the coverage rate and the numerical aperture of objectives are selected for experimental research. Using the twophoton microfabrication system we built, the experimental resuts under the different conditions varing one process parameter while fixing the other process parameters are compared and the effect of the parameter on the processing quality is discussed. Some experimental results after the optimization of the process parameters are given.
出处 《微细加工技术》 2003年第2期59-63,共5页 Microfabrication Technology
基金 国家自然科学基金资助项目(50275140)
关键词 双光子三维微细加工 工艺参数 激发光强 覆盖率 物镜数值孔径 two-photon microfabrication exciting laser intensity coverage rate numerical aperture of objective
  • 相关文献

参考文献4

  • 1ES Wu,J Strickler, R Harrel, et al. Two-photon lithography for microelectronic application[J ]. SPIE Proc,1992,1674: 776.
  • 2B H Cumpston,S P Ananthavel, S Barlow, et al. Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication[J ]. Nature, 1999,398: 51 - 54.
  • 3Yongiun Zhou, Deqiang Chen, Wenhao Huang, et al. An alternative method for simulating IPSF in two-photon laser scanning microscopy[J]. Proc SPIE,2002,4927:413 - 419.
  • 4Miwa M, Juodkazis S, Kawakami T, et al. Femtosecond two-photon stereo-lithography[J]. Appl Phys AMater,2001,73(5) :561 - 566.

同被引文献38

  • 1袁大军,蒋中伟,徐藻,郭锐,王翔,黄文浩,夏安东,褚家如.双光子三维微细加工的进展[J].纳米技术与精密工程,2004,2(1):50-53. 被引量:3
  • 2蒋中伟,袁大军,郭锐,徐藻,王翔,夏安东,黄文浩.双光子三维微细加工的分辨率研究[J].微细加工技术,2004(2):31-36. 被引量:6
  • 3D A Parthenopoulos,P M Rentzepis.Three-dimensional optical storage memory[J].Science,1989,245:843-845.
  • 4Xia A D,Wada S,Tashiro H,et al.Two-photon-induced photooxidation as a means for 3D optical data storage[J].Proc SPIE,1999,3740:402-405.
  • 5B H Cumpston,S P Ananthavel,Stephen Barlow.Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication[J].Nature,1999,398:51-54.
  • 6ES Wu,J Strickler,R Harrel,et al.Two-photon lithography for microelectronic application[J].Proc SPIE,1992,1674:776-782.
  • 7Satoshi Kawata,Hong-Bo Sun,Tomokazu Tanaka,et al.Finer features for functional micro devices[J].Nature,2001,412:697-698.
  • 8Hong-Bo Sun,Takeshi Kawakami,Ying Xu.Real three-dimensional microstructures fabricated by photopolymerization of resins through two-photon absorption[J].Opt Lett,2000,25:1110-1112.
  • 9Yongjun Zhou,Deqiang Chen,Wenhao Huang,et al.An alternative method for simulating IPSF in two-photon laser scanning microscopy[J].Proc SPIE,2002,4927:413-419.
  • 10刘鸿文.材料力学(第三版)[M].北京:高等教育出版社,1992..

引证文献5

二级引证文献10

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部