摘要
采用射频磁控溅射法沉积了CN薄膜 ,利用XPS ,XRD ,FTIR等测试手段研究了CN薄膜的成分和结构。结果表明 :CN薄膜为非晶结构 ;CN薄膜中n(N) /n(C)随沉积室中N2 浓度的增加而增大 ,n(N) /n(C)最高可达到 0 .3 3 ;CN薄膜中主要含有CC ,C—C ,C—N ,CN ,C≡N等原子基团 ;N在CN薄膜中主要起稳定sp2 C的作用。利用椭圆偏振仪测量了CN薄膜的折射率和厚度。对薄膜的折射率与N含量之间关系的研究发现 :CN薄膜的折射率随n(N) /n(C)的增加而减小 ;CN薄膜的折射率由 2 .2减小到 1.8。
The CN film was deposited by the radio-frequency sputtering technique and its composition and structure were investigated by means of XPS, XRD and FTIR. The refractive indexes of CN films are measured with ellipsometric polarimeter. The results show that CN films are amorphous, and the ratio of n(N)/n(C) in films increases with the increase of N2 concentration in depositing chamber, which can reach 0.33. There are radicals C=C, C-C, C-N, C=N, etc. in the films. The sp2C content is stabilized with the N content augment. Researching the relationship between the refractive index and the N content, it is found that the refractive index of CN films decreases with the increase of n(N)/n(C) and it is changed from 2.2 to 1.8.
出处
《硅酸盐学报》
EI
CAS
CSCD
北大核心
2003年第5期465-469,共5页
Journal of The Chinese Ceramic Society
基金
总装备部预研基金
武汉市晨光基金资助项目
关键词
氮化碳薄膜
折射率
结构
射频溅射沉积
Carbon inorganic compounds
Nitrogen
Nitrogen compounds
Refractive index
Sputter deposition
