摘要
采用真空热蒸发沉积技术在衬底上沉积了 WO3 薄膜 ;以金属 W粉为无机原料 ,溶胶 -凝胶技术结合浸渍镀膜方法制备出 WO3 薄膜 ,借助 SEM、可见光分光光度计、椭偏仪等仪器测量了薄膜的特性。实验表明 :热处理使两种方法制得的薄膜致密 ,折射率增大 ,WO3 颗粒增大 ;在热处理条件相同的情况下 ,溶胶 -凝胶法制备的 WO3 薄膜折射率比热蒸镀法制备的 WO3
WO 3 thin films are deposited on substrate by the vacuum thermal evaporation method. The preparation of WO 3 thin films has been reported using a sol gel process together with the dip coating method, and tungsten powder being the raw material. Thin films are heat treated at different temperatures, the effects have been investigated with SEM, ellipsometer, spectrophotometer and profile respectively. Thickness of the films decreases with annerling temperature increasing, while refractive index of the films increases and WO 3 particles in the films grow.
出处
《光电子技术》
CAS
2003年第2期89-91,125,共4页
Optoelectronic Technology