利用全息相衬干涉显微术研究EDTA对KDP晶体生长习性的影响

HPCIM Investigation of the Effect of EDTA Additives on Growth Habit of KDP

利用全息相衬干涉显微术 (HPCIM)研究了EDTA对KDP晶体 (10 0 )柱面和 (10 1)锥面生长习性的影响。通过界面边界层宽度的变化 ,可以直观地观测到在溶液中添加少量的EDTA后 ,促使KDP晶体沿柱面和锥面的生长 ,特别是对柱面的影响更为显著 ,并对此作了解释。最佳的EDTA浓度范围有待于进一步研究。

The effect of EDTA additives on the growth habit of KDP was investigated by using HPCIM. Both the growth along prismatic faces and pyramidal faces are enhanced after adding a small quantity of EDTA into the growth solution. The effect on the pyramidal faces is not considerable compared with prismatic faces and we give an explanation for it.The proper content of EDTA need to be studied further.