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强直电流伸展弧CVD硬质合金金刚石涂层工具 被引量：2

Large Area Diamond Coatings on Cemented Carbide Tools by a High Current Extended DC Arc Plasma CVD System
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摘要 采用自行研制的强电流直流扩展电弧设备对酸浸和渗硼预处理的YG6刀片进行了金刚石薄膜涂层沉积,并对放于不同位置的沉积刀片表面涂层的激光Raman谱和SEM形貌进行了分析、研究.结果表明:渗硼预处理工艺优于酸浸预处理工艺;在渗硼处理的GY6刀片上,沉积的金刚石薄膜涂层具有大面积、均匀性好和质量高的特点. High current extended DC arc plasma equipment was manufactured to carry out CVD film deposition on acid-etching and boronizing samples of the cemented carbide cutter YG6, and the surface coating of deposition at different positions of the blade were analyzed by Raman spectra and SEM. The results show that the boronizing pretreatment technology is superior to the acid etching pretreatment technology, for CVD film coating on the blade by boronizinf pretreatment has advantages of large area, good homogeneity and high quality.
作者 宋建华 苗晋琦 张恒大 唐伟忠 吕反修 田晶泽
机构地区 北京科技大学材料科学与工程学院
出处 《北京科技大学学报》 EI CAS CSCD 北大核心 2003年第3期248-250,共3页 Journal of University of Science and Technology Beijing
基金 国家"九五"重大项目(No.863-715-Z38-03)
关键词 金刚石涂层工具 强电流直流扩展电弧 YG6刀片 硬质合金工具 CVD 渗硼预处理 酸浸预处理 表面形貌 high current extended DC arc plasma large area homogeneity diamond coating
分类号 TG711 [金属学及工艺—刀具与模具] TG174.442 [金属学及工艺—金属表面处理]
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参考文献8

  • 1Buck V, Deuerler F. Enhanced nucleation of diamond films on pretreated substrates [J]. Diamond and Related Materials, 1998(7): 1544.
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同被引文献19

  • 1耿春雷,黑立富,刘素田,唐伟忠,吕反修.硬质合金微型钻头金刚石涂层预处理工艺对其断裂强度的影响[J].金刚石与磨料磨具工程,2006,26(6):36-41. 被引量：5
  • 2刘素田,黑立富,耿春雷,唐伟忠,吕反修.强电流直流扩展弧金刚石沉积技术的研究[J].表面技术,2006,35(3):42-44. 被引量：2
  • 3Karner J,Pedrazzini M,Hollenstein C.High current d.c.arc (HCDCA) technique for diamond deposition[J].Diamond and Related Materials,1996,5(3-5):217-220
  • 4Haubner R,Lux B.On the formation of diamond coatings on WC/Co hard metal tools[J].Internal Journal of Refractory Metals and Hard Materials,1996,14(1-3):111-118
  • 5Reineck I,Sjstrand M E,Karner J,et al.Diamond coated cutting tools[J].Internal Journal of Refractory Metals and Hard Materials,1996,14(1-3):187-193
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  • 7苗晋崎.硬质合金微米-纳米金刚石复合涂层工具及细晶金刚石涂层工具的研究[D].北京:北京科技大学,2004.81-83
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  • 10Almeida F A, Soares E, Femandes A J S, et al. Diamond Film Adhesion onto Sub-micrometric WC-Co Substrates [ J ]. Vacuum,2011 ,$5 (12) : 1135-1139.

引证文献2

二级引证文献3

北京科技大学学报
2003年 第3期

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