渗透胁迫对小麦根、胚芽生长及其质膜氧化还原系统的影响

Effects of osmotic stress on growth and redox system of plasma membrane in wheat roots and shoots.

小麦根及胚芽的质膜均存在氧化还原系统,正常供水时小麦胚芽生长最快时期活体质膜氧化NADH速率最高,PEG-6000溶液(200g/kg)渗透胁迫时小麦根和胚芽生长明显受抑,完整根、芽还原K_3Fe(CN)_6的能力增强,且小麦胚芽的还原能力增幅较大,但胁迫初期和末期NADH氧化速率高于对照,其余时期无明显变化。

There exists a redox system at the surface of the roots and shoots in winter wheat. The oxidation rate of NADH of the shoots is the highest at the fastest growth stage under normal water supply. The growth of roots and shoots is significantly inhibited under osmotic stress. In plasma membrane of roots and shoots, the force of reducing K3Fe(CN)6 is increased under stress, and that of shoots is more stimulated, however, the oxidation rate of NADH is higher than that of control at the stress beginnings and final stages, and no significant differences is observed at other periods.