全离子注入NPN型偶载场效应晶体管的离子注入工艺研究

A STUDY ON THE ION IMPLANTATION OF NPN VDCFET

通过trim软件和高斯模型对离子注入后快速退火载流子分布进行设计 ,初步构造出离子注入的分布图像 ,通过与实验结果比较 ,进一步完善模型 .选用高斯与半高斯混合模型 ,得到了与实验结果更吻合的模拟方案 .从而找到了研制NPN型偶载场效应晶体管 (VDCFET)离子注入的最佳条件 ,并研制了性能良好的VDCFET .

Vertical dual carrier field effect transistor(VDCFET) is a new design of transistor which contains two different kind of carriers during the working condition. The key part of VDCFET is the contact region which is also called the field effect channel. The shorter the channel, the better the working function of the transistor. If VDCFET is fabricated by ion implantation, the design of ion implantation is very difficult. By using software of trim and a Gauss model, the distribution of ion implantation is obtained. Compared with the experimental results, the method is improved and a simulation method called half Gauss model is adopted. On a large scale, the result of the new method is access to the experimental results. As a result, the optimal factor of fabricating VDCFET is obtained and a good VDCFET is fabricated.