摘要
压印光刻技术将传统的模具复型原理应用到微观制造领域 ,是一种低成本高效率的集成电路制造技术。国外压印光刻工艺主要为热压印。针对热压印光刻工艺中因热变形而导致精度丧失的问题 ,提出了冷压印光刻。冷压印光刻的复型分辨率和复型质量高 ,解决了热压印光刻中的诸多难题 ,实现了 0 .
Imprint lithography used in micro manufacturing is a low-cost and high-efficiency IC manufacturing technology. Aiming at the lost accuracy happened in HEL(hot embossing lithography) because of thermal distortion ,room-temperature imprint lithography is proposed. The room temperature imprint lithography has overcome many difficulties appeared in HEL and has high resolution. As a result the replication of sub 0.1μm structure is realized.
出处
《电加工与模具》
2003年第3期53-55,共3页
Electromachining & Mould
基金
国家自然科学基金资助项目 ( 5 0 2 75 118)
国家 863计划重点项目 ( 2 0 0 2AA42 0 0 5 0 )
关键词
集成电路
热压印光刻
冷压印光刻
复型
分辨率
integrated circuit
hot embossing lithography
room temperature imprint lithography
replication
