期刊文献+

Preparation of Scratch-Resistant Nano-Porous Silica Films Derived by Sol-Gel Process and Their Anti-reflective Properties

Preparation of Scratch-Resistant Nano-Porous Silica Films Derived by Sol-Gel Process and Their Anti-reflective Properties
下载PDF
导出
摘要 Structural strengthening of the nano porous silica films has been reported. The films were prepared with a base/acid two-step catalyzed TEOS-based sol-gel processing and dip-coating, and then baked in the mixed gas of ammonia and water vapor. The silica films were characterized with TEM, AFM, FTIR, spectrophotometer, ellipsometer, and abrasion test, respectively. The experimental results have shown that the films have a nanostructure with a low refractive index and can form an excellent scratch-resistant broadband anti-reflectance. The two-step catalysis noticeably strengthens the films, and the mixed gas treatment further improves mechanical strength of the silica network. Finally the strengthening mechanism has been discussed. Structural strengthening of the nano porous silica films has been reported. The films were prepared with a base/acid two-step catalyzed TEOS-based sol-gel processing and dip-coating, and then baked in the mixed gas of ammonia and water vapor. The silica films were characterized with TEM, AFM, FTIR, spectrophotometer, ellipsometer, and abrasion test, respectively. The experimental results have shown that the films have a nanostructure with a low refractive index and can form an excellent scratch-resistant broadband anti-reflectance. The two-step catalysis noticeably strengthens the films, and the mixed gas treatment further improves mechanical strength of the silica network. Finally the strengthening mechanism has been discussed.
出处 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2003年第4期299-302,共4页 材料科学技术(英文版)
基金 the National Natural Science Foundation of China(No:69978017,20133040) Shanghai Key Subject Programme,Chinese Foundation of High Technology(2002AA842052) Shanghai Natural Science Foundation(02ZE14101)as well as Shanghai Nanotechnology Promotion Center(0159um039).
关键词 Sol-gel process Silica films Anti-reflectance Nano porous structure Sol-gel process, Silica films, Anti-reflectance, Nano porous structure
  • 相关文献

参考文献15

  • 1G.M.Wu, T.H.Yang, J.Wang, H.L.Zhang and J.Shen, : High Temperatures High Pressures, 2000, 32, 687.
  • 2P.Nostell, A.Roos and B.Karlsson: Thin Solid Films, 1999,351, 170.
  • 3M.A.Einarsrud and E.Nilson: Journal Non-Crystalline Solids,1998, 226, 122.
  • 4S.Haereid, M.Dahle and M.A.Einarsrud: Journal Non-Crystalline Solids, 1995, 186, 96.
  • 5H.G.Floch and P.F.Belleville: SPIE, Sol-Gel Optics Ⅱ, 1992,1758. 135.
  • 6P.F.Belleville, H.G.Floch: SPIE, Sol-Gel Optics Ⅲ, 1994,2288, 25.
  • 7X.M.Du and R.Almeida.: J. Sol-Gel-Sci. Technol., 1997, 8, 377.
  • 8H.Imei, M.Yasumori, H.Hirashima, K.Awazu and H.Onuki: J.Appl. Phys., 1996, 79(11), 8304.
  • 9M.S.Sahota, E.L.Short and J.Beynon: J. Non-Cryst. Solids,1996, 195, 83.
  • 10A.Labrosse and A.Burneau: J. Non-Cryst. Solids, 1997, 221~107.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部