摘要
本文应用DSC研究了非晶态Pd-Cu-Si合金的晶化过程动力学.根据Kissinger峰移法和Arrhenius方程分别计算了晶化激活能,发现等温晶化动力学在0.15<x<0.85范围内符合J-M-A方程,Avrami指数=3.0.引用阶段Avrami指数和阶段激活能,研究了晶化过程中不同阶段的形核和长大行为。
Crystallization kinetics of Pd-Cu-Si glass was studied by DSC. Apparent activation energy was calculated according to Kissinger peak shift method and Arrhenius equation. The isothermal crystallization kinetics, ranged 0.15×0.85, was found to be in agreement with John-Mehl-Avrami equation with n=3.0. Nucleation and growth during isothermal crystallization of Pd-Cu-Si system were approached by introducing the concepts of local Avrami exponent and local activation energy.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1992年第7期B303-B307,共5页
Acta Metallurgica Sinica
关键词
晶化
动力学
非晶态合金
Pd-Cu-Si glass, crystallization kinetics, local Avrami exponent, local activation energy
