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酸增殖剂研究进展 被引量:4

THE PROGRESS OF ACID AMPLIFIER INVESTIGATIONS
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摘要 本文综述了能有效提高化学增幅抗蚀剂体系感度的各种类型酸增殖剂及其酸增殖机理.对某些常用于光致抗蚀剂中的酸增殖剂的特性作了介绍.并对它们的应用前景、现存问题和改进方向进行了简单讨论和介绍. This article reviews the various acid amplifiers which can effectively elevate the photosensitivity in the chemically amplified photoresist systems and their reaction mechanism of acid amplification.The application prospect,existing problem and future improvement of these materials are also discussed.
出处 《感光科学与光化学》 SCIE EI CAS CSCD 北大核心 2003年第4期296-302,共7页 Photographic Science and Photochemistry
基金 2002-2003国家重点863项目(2002AA3Z1330)
关键词 化学增幅抗蚀剂 酸增殖剂 光致抗蚀剂 感度 chemically amplified photoresist acid amplifier photosensitivity
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参考文献15

  • 1于尚先 顾江楠.酸增殖型光致抗蚀剂技术的进展[c]..2000年辐射固化年会论文报告集(中国感光学会辐射固化分会主办)[C].山东威海,2000.10.
  • 2Kunihiro Ichimura,Koji Arimitsu,Kazauaki Kudo, et al. Acid proliferation reactions and their applications[J]. Chem.Lett. , 1995,7:511.
  • 3Koji Arimitsu, Kazuaki Kudo, Hironori Ohmori, et al. Sensitivity enhancement of chemical-amplification-type plaotoimaging materials by acetoacetic acid derivatives[J ]. J . Photolpolym . Sci . Technol . , 1995,8:43.
  • 4Kazuaki Kudo, Koji Arimitsu, Hironori Ohmori, et al. Enhancement of the sensitivity of chemical-amplification-type photoirnaging materials by β-tosyloxyketone acetals[J]. J. Photopolym. Sci. Technol. , 1995,8: 45.
  • 5Kazuaki Kudo,Koji Arimitsu,Kunihiro Ichimura, et al. Autocatalytic decomposition of a β-tosyloxyketone acetal as anacid amplifier[J ]. Mol. Cryst. Liq. Cryst., 1996,280: 307.
  • 6Koji Arimitsu,Kazuaki Kudo, Y Hayashi, et al. Effect of phenolic hydroxyl residues on the improvement of sold-proliferation-type photoimaging materials[J]. J. Photopolym. Sci. Technnl., 1996,9: 29.
  • 7Kunihiro Ichirnura, Koji Arimitsu, Soh Noguchi, Kazuaki Kudo. Chem. amplified acid proliferation reactions of amplitiers and their application to chem. amplified lithog, photoresists oontg, photoacid ganerators[J ]. ACS Symp. Ser.1998,706 ( Micro-and Nanopatterning polymers ), American Chemistry Society, 161-171.
  • 8Kunihiro Ichimura. Acid proliferation reactions and application[J]. Polym. Mater. Sci. Eng. ,1997,77:434-435.
  • 9Koji Arimitsu, Kunihiro Ichimura. Trioxane derivative as an acid amplifier exhibiting a non-linear organic reaction[J].Chemistry Letter, 1998: 823-824.
  • 10Koji Arimitsu,Kazuaki Kudo, Hironofi Ohmori, et al. Acid proliferation reaction using photogenerated acid to enhance photosensitivity of chem. amplified photoresists[J]. J. Mater. Chem., 2001,11:295-301.

同被引文献26

  • 1张阳,张存林,周庆莉,章鹤龄,薛佳丹.激光热交联型CTP版材的改进[J].光学技术,2005,31(4):572-574. 被引量:2
  • 2王健,王文广,张伟民,蒲嘉陵.三嗪类化合物的合成及其产酸性能研究[J].感光科学与光化学,2006,24(6):436-443. 被引量:10
  • 3Nunihiro Ichimura. Nonlinear organic reactions to proliferate acidic and basic molecules and their applications[J]. The chemical recorder, 2002,2(10) :46-55.
  • 4Davies M T, Bobson D F, Hayman D F. Some 1-Arylclohexane 1,2-Diols[J]. Journal of Tetrahedron, 1962,18: 751-761.
  • 5Carruthers W. Some modern methods of organic synthesis(3rd edition) [ M ]. Cambridge university press, 1986,364-373.
  • 6王力元,高敏,王飞.光产酸剂的热解性质及其在热敏CTP版材中的应用[A].第十届亚洲辐射固化国际会议论文集[C].中国上海:2005.
  • 7[1]Kunihiro Ichimura. Nonlinear organic reactions to proliferate acidic and basicmolecules and their applications [ J]. The Chemical Recorder, 2002,2(10) :46~55
  • 8[2]Kunihiro Ichimura. Acid proliferation reactions and application[J].Polym Mater Sci Eng, 1997, 77:434~435
  • 9[3]Carruthers W. Some modern methods of organic synthesis(3rd edition) [M]. Landon: Cambridge University Press, 1986. 364~373
  • 10[6]Dacies M T, Bobson D F, Hayman D F. Some 1-arylclohexane-1,2-diols [J]. J Tetrahedron, 1962,18:751~761

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