摘要
本文综述了能有效提高化学增幅抗蚀剂体系感度的各种类型酸增殖剂及其酸增殖机理.对某些常用于光致抗蚀剂中的酸增殖剂的特性作了介绍.并对它们的应用前景、现存问题和改进方向进行了简单讨论和介绍.
This article reviews the various acid amplifiers which can effectively elevate the photosensitivity in the chemically amplified photoresist systems and their reaction mechanism of acid amplification.The application prospect,existing problem and future improvement of these materials are also discussed.
出处
《感光科学与光化学》
SCIE
EI
CAS
CSCD
北大核心
2003年第4期296-302,共7页
Photographic Science and Photochemistry
基金
2002-2003国家重点863项目(2002AA3Z1330)
关键词
化学增幅抗蚀剂
酸增殖剂
光致抗蚀剂
感度
chemically amplified photoresist
acid amplifier
photosensitivity