电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响

Property comparison of optical thin films prepared by E-beam, ion assisted deposition and ion beam sputtering

运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工艺对这些薄膜性能的不同影响,以判断合理的沉积工艺。

The optical thin films, including single thin films of ZrO2, TiO2, Al2O3 and AR coatings, were respectively prepared by Ebeam, ion assisted deposition and ion beam sputtering. Then these thin films' properties were measured by several methods, such as profilemeter, atomic force microscopy, surface thermal lensing and Xray diffraction. The thin films' refractive index, surface roughness, absorption and microstructure were given and discussed. Finally, the conclusion was drawn: the option of proper technique to fabricate optical thin films is ion assisted deposition.