摘要
介绍两种用亚稳态氦原子束制作纳米结构的新方法。亚稳态原子束从原子源喷出后首先对其进行横向激光冷却,准直后的原子束穿过与之垂直的激光驻波场时发生淬火过程,原子的密度分布出现沟道化效应,给出基于光掩模制作纳米图形的基本原理、理论分析及模拟结果。介绍基于物理掩模制作纳米图形的原理和SAM抗蚀剂,利用沉积在基底上的亚稳态原子破坏基底上的SAM膜,结合刻蚀技术可制作出纳米量级的图形。
Two new methods using metastable helium atomic beam to fabricate nanostructures are introduced. A metastable helium atomic beam effusing out of atom source is firstly cooled by transversally in cident laser. This wellcollimated atomic beam traveling through the light standingwave whose direction is perpendicular to atomic beam is quenched, and channeling effect happens in atomic density distribution. In this paper the basic principle of this technique based on mask made of light and theoretical analysis as well as simulation results are given. The principle of another method based on physical mask and SAM(selfassembled monolayers) resists are presented, the SAM on substrate is destroyed by deposited metastable atoms on substrate, and the nanometer-scale structure will be fabricated with etching technologies.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2003年第9期919-922,共4页
High Power Laser and Particle Beams
基金
中科院知识工程创新课题(A2K0009)
中科院开放基金资助课题