大角度蚀刻衍射光栅的模拟

Simulation for an Etched Diffraction Grating(EDG) of Wide Angle

研究了平面波导密集波分复用器件中很有发展潜力的蚀刻衍射光栅 (EDG) 小角度范围光栅的模拟通常采用高斯近似的输入光场 ,由于近轴的高斯光场接近实际光场 ,所以模拟结果很准确 但这种方法应用于大角度范围的光栅则有偏差 本文提出了大角度蚀刻衍射光栅的模拟方法 ,分析了这种偏差并给出了模拟结果

As a key device in a DWDM system, an Etching Diffraction Grating (EDG) is a potential planar waveguide wavelength demultiplexer. For an EDG of narrow angle it is quite accurate to use a Gaussian field as the incident field in the simulation. However, the error increases when it′s applied to an EDG of wide angle. The simulation method based on a diffraction theory for an EDG of wide angle is presented. The errors are analyzed and the simulation results are given. The simulation method is also suitable for arbitrary incident field.