摘要
在分析原子束计算全息片特点的基础上 ,提出采用罗曼Ⅲ型傅里叶变换计算全息图设计原子束计算全息片 ,给出设计步骤 ,然后提出采用电子束光刻编码矩孔图形 ,ICP各向异性刻蚀SiN薄膜的全息片制作方案 ,对全息片的制作工艺流程详细予以介绍 。
Based on analyzing the specialty of the CGH for atoms the design scheme is presented with the Lohmann Ⅲ coding Fourier transform CGH. To fabricate the CGH, the electronic beam lithography is used to exposure the rectangle holes on the SiN film firstly, and then the ICP is used to etch the holes anisotropically The technological process is discussed in detail and in the end a photograph of SiN film CGH is shown.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2003年第5期598-600,共3页
Acta Photonica Sinica
基金
中国科学院"知识创新工程"项目资助 (A2K0 0 0 9)