摘要
对化学增幅抗蚀剂体系的组成及化学增幅作用做了阐述。介绍了化学增幅作用中的关键组分———光产酸源和酸增殖剂的发展概况 ,并对重氮盐、盐、有机多卤化物、磺酸酯类化合物等产酸源的产酸机理、适用光源分别进行了阐述。从目前国际发展的趋势来看 ,硫盐和磺酸酯类的光产酸源占据主要地位 ,有机多卤化物中的三嗪化合物还有少量应用。
The chemical amplification of resist was explained in this article. In addition the key components of resist systems such as acid generator and acid amplifer were summarized in detail. The mechanism and suitable wavelength of photoacid generators such as diazonium salt, onium, sulfonate, organ multi halide were described respectively. From the view of internationally developing, onium and sulfonate compounds were the main part of photoacid generators. Triazine compounds were used in some extent. Pinacol mono sulfonate compounds were employed commonly as acid amplifer.
出处
《化学通报》
CAS
CSCD
北大核心
2003年第7期474-478,共5页
Chemistry
基金
国家‘8 6 3’计划资助项目 ( 2 0 0 1AA32 710 2 )
