摘要
提出一种测定氧扩散系数新方法。用Sol-gel法制备了Y2O3/SiO2均匀致密的薄膜,能成功解决其它方法无法得到的冶炼所得到的熔体,光学椭偏测定氧化层的膜厚。探讨了氧在薄膜中的扩散,在Wagner理论基础上,用数学方法表达在掺杂SiO2薄膜氧扩散系数与氧化层膜厚的关系。
The paper studied oxygen diffusion through Y2O3/SiO2 thin film, which was uniform and compact, formed by Sol-Gel process Correlation between oxygen diffusion coefficient and oxidation scale produced by simple mathematics was based on Wagner theory and the model of oxygen diffusion was proposed
出处
《贵州科学》
2003年第1期17-19,共3页
Guizhou Science
基金
国家自然科学基金资助项目(批准号:59761001)
