表面起伏光栅形成速率的影响规律Ⅱ.偶氮生色团上甲基取代基的影响

INFLUENCES ON INSCRIPTION RATES OF SURFACE RELIEF GRATINGS Ⅱ. METHYL SUBSTITUENT EFFECT OF AZO CHROMOPHORES

设计并合成了偶氮生色团上含有不同数目甲基取代基的环氧树脂类偶氮高分子 .研究了偶氮生色团上甲基取代对表面起伏光栅形成速率的影响规律 .实验结果表明 ,在偶氮生色团上引入甲基取代基使光栅形成的速率明显减慢 ,引入甲基数目越多 ,光栅形成速率就越慢 .

A series of polymers containing azo chromophores with different number of methyl substituents have been designed and synthesized.Three epoxy based precursor polymers were prepared by reactions of diglycidyl ether of bisphenol A with aniline,3 methylaniline,and 3,5 dimethylaniline respectively.The precursor polymers were reacted with diazonium salt at the final stage of the synthetic routes to introduce donor acceptor type azo chromophores.The polymers synthesized were characterized by using various spectroscopic methods and thermal analysis.Photoprocessibility of photoinduced surface relief gratings on the polymer films was studied carefully.With the same irradiating light intensity and approximately equal film thickness,the rates of SRG formation significantly depend on the number of methyl substituents on the azo chromophores.For polymers with the same type of electron withdrawing group,the inscription rates decrease with the increase of the number of methyl substituents on the azo chromophores.