氟化物溶液腐蚀后硅表面形态的STM与XPS研究

The STM and XPS Characterization of Etched Si (111) Surfaces

利用扫描隧道显微技术(STM)和X 射线光电子能谱(XPS)技术,研究了Si(111)在几种不同比例的NH4F HCl溶液中被腐蚀后的表面形态及洁净度.通过分析表面的STM图像与XPS谱图,表明在较高pH值的NH4F HCl溶液中被腐蚀的Si(111)表面粗糙度较小,且表面洁净度及化学稳定性较好.

The morphologies and cleanness of Si (111) surface etched in several NH4FHCl solutions have been studied by Scanning Tunneling Microscopy (STM) and XRay Photoelectric Spectroscopy (XPS) . Analysis of the surface STM images and XPS spectra indicated that higher pH NH4FHCl solutions led to smoother, cleaner and more chemically stable surfaces. 