摘要
对真空蒸镀钝化太安 (PETN)炸药薄膜进行了研究。分析了真空度、蒸镀温度、蒸发速率、基片表面状态等因素对形成薄膜的影响。得出了适宜蒸镀的真空条件、最佳蒸镀温度和蒸发速率 ;提出了增加薄膜和基片附着力的方法。
Growth of desensitizing pentaerythritol tetranitrate(PETN)passivation films were studied to improve its quality by optimizing growth conditions,including base pressure,evaporation temperature and evaporation rate,and surface microstructures of substrates.Our preliminary results show that the glue coated on substrates increases the interfacial adhesion.
出处
《真空科学与技术》
CSCD
北大核心
2003年第4期287-288,286,共3页
Vacuum Science and Technology
基金
教育部博士点基金资助项目19990 0 0 70 4
关键词
炸药薄膜
真空度
蒸发速率
基片表面状态
Explosive film,Vacuum degree,Evaporation rate,Surface state of substrate
