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EFFECT OF ANNEALING TREATMENT ON THE STRUCTURE OF CdS FILMS

EFFECT OF ANNEALING TREATMENT ON THE STRUCTURE OF CdS FILMS
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摘要 The effect of annealing treatment on the structure of CdS films was investigated. The cadmium sulfide thin films were prepared by chemical bath deposition, and were annealed at nitrogen atmosphere at different temperatures. The films were characterized by SEM and XPS (X-ray photoelectron spectroscopy). X-ray photoelectron spectroscopy was used to examine the chemical states on the CdS films surface. It was found that thermal annealing could produce large grains of CdS thin films, remove the air contamination and reduce the oxygen content on the CdS films surface. Therefore, the CdS films changed more uniform and smoother surface after thermal annealing. The effect of annealing treatment on the structure of CdS films was investigated. The cadmium sulfide thin films were prepared by chemical bath deposition, and were annealed at nitrogen atmosphere at different temperatures. The films were characterized by SEM and XPS (X-ray photoelectron spectroscopy). X-ray photoelectron spectroscopy was used to examine the chemical states on the CdS films surface. It was found that thermal annealing could produce large grains of CdS thin films, remove the air contamination and reduce the oxygen content on the CdS films surface. Therefore, the CdS films changed more uniform and smoother surface after thermal annealing.
出处 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2003年第4期313-318,共6页 金属学报(英文版)
基金 The financial support was provided by the National High Technology Research and Development Program of China(Grant No.2001AA513011).
关键词 XPS CdS thin film CBD (chemical bath deposition) XPS, CdS thin film, CBD (chemical bath deposition)
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  • 1P. Lianos and J.K. Thomas, Chem. Phys. Let. 125 (1986) 299.
  • 2P.M.S. Ferreira, A.B. Timmons, M.C. Neves, P. Dynarowics and T. Trindade, Thin Solid Films 389(2001) 272.
  • 3A.V. Murugan, R.S. Sonawane, B.B. Kale, S.K. Apte and A.V. Kulkarni, Matter. Chem. Phys. 71(2001) 98.
  • 4D.J. Riley and E.J. Tull, J. Electroanalytical Chem. 504 (2001) 45.
  • 5H. Wellmann, J. Rathousky, M. Wark, A. Zukal and G. Schuiz-Ekloff, Microporous and Mesoporous Mater. 44 (2001) 419.
  • 6D. Kim, A.L. Fahrenbruch, A.L. Otero and R.H. Bube, J. Appl. Phys. 75 (1994) 2673.
  • 7Y. Tomita, T. Kawai and Y. Hatanka, Jpn. J. Appl. Phys. 633 (1994) 3383.
  • 8J.W. Park, B.T. Ahn, H.B. Im and J.W. Bohnee, J. Electrochem. Soc 139 (1992) 3351.
  • 9T. Gacoin, L. Malier and J.P. Boilot, Chem. Mater. 9 (1997) 1502.
  • 10A.K. Berry, P.M. Amirtharaj, J. Du and D.D. Dartin, Thin Solid Films, 219 (1992) 153.

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