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脉冲源所镀DLC膜成份的分析 被引量：1

Composition Analysis of DLC Films Deposited by Pulsed Ion Source
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摘要 　类金刚石薄膜(DLC膜)的成份(主要指sp3键和sp2键)是影响薄膜性能如薄膜的机械特性和电阻特性等的重要因素。因此,研究DLC膜的成份是非常必要的。本文介绍用X射线光电子能谱仪(XPS)测量薄膜成份的方法。通过采用脉冲真空电弧离子源研究在各种工艺条件下镀制的DLC膜,发现了影响DLC膜成份的主要因素。 The composition(including sp3 and sp2) of diamondlike carbon film (DLC film) is an important factor that influences the film properties (mechanical property, resistance property etc), so it is very necessary to study the composition of DLC film. In this paper, the XPS method measuring the composition of DLC film is introduced. The composition of DLC film deposited by pulsed vacuum arc ion source under all technique conditions was measured by XPS, and the main factors that influence the composition of DLC film were educed.
作者 弥谦 蔡长龙
机构地区 西安工业学院光电工程学院
出处 《应用光学》 CAS CSCD 2003年第5期44-46,共3页 Journal of Applied Optics
关键词 DLC膜 类金刚石薄膜 成份分析 机械特性 电阻特性 X射线光电子能谱仪 脉冲真空电弧离子源 pulsed arc DLC films film composition
分类号 O484.4 [理学—固体物理]
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参考文献5

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共引文献15

同被引文献13

  • 1白婷,刘晶儒,叶景峰,王晟,叶锡生.宽波段的类金刚石薄膜光学窗口[J].强激光与粒子束,2006,18(10):1629-1633. 被引量：3
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应用光学
2003年 第5期

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