摘要
此工作致力于无约束各向同性弹性薄膜在表面应力发生变化时几何非线性变形分析· 基于能量的考虑,导出了曲率与表面应力变化量的关系· 与已有线弹性分析结果的显著区别是,当薄膜很薄而上下表面应力差足够大时,薄膜曲率的解不再唯一。
A geometrically nonlinear analysis was proposed for the deformation of a free standing elastically isotropic wafer caused by the surface stress change on one surface. The link between the curvature and the change in surface stress was obtained analytically from energetic consideration. In contrast to the existing linear analysis, a remarkable consequence is that, when the wafer is very thin or the surface stress difference between the two major surfaces is large enough, the shape of the wafer will bifurcate.
出处
《应用数学和力学》
EI
CSCD
北大核心
2003年第10期1012-1016,共5页
Applied Mathematics and Mechanics
关键词
弹性薄膜
曲率
表面应力
几何非线性
elastic wafer
curvature
surface stress
geometric nonlinearity
