摘要
以低铈混合氯化稀土为原料,NH3·H2O为沉淀剂,空气和H2O2为氧化剂,经选择性氧化沉淀、洗涤、烘干、煅烧制备用于光学玻璃抛光材料的超细CeO2前驱体。研究了氧化沉淀条件与加料方式对前驱体中氧化铈含量的影响,以及煅烧温度与前驱体粉末粒度、比表面和物相组成的相关关系。结果表明:采取正序滴加进料方式,控制沉淀过程pH值在4.5～5.5范围,可以使Ce3+氧化成Ce4+并形成氢氧化物沉淀而与其他稀土离子分离,沉淀物在600～700℃煅烧,得到CeO2含量大于80%,中位粒径D50小于1.5μm的超细CeO2抛光粉前驱体。
The ultra-fine CeO2 precursor for optical glass polishing material was prepared by selective oxidation and precipitation, washing, drying and calcination from low-cerium complex rare earth chlorides solution with NH3.H2O as precipitator, air and H2O2 as oxidative agent.The effect of reaction conditions and feeding mode on the content of CeO2 in precursor,and the correlativity between calcination temperature and particle size,specific surface area and mineralogical composition of precursor powder were investigated.The results show that by forward dripping, pH value controlled within 4.5 and 5.5,Ce3+ can be oxidized into Ce4+ to form hydroxide precipitant,followed by separation with other RE ions the ultra-fine polishing powder and precipitation before calcinations at 600～700 ℃ to obtain ultra-fine CeO2 precursor with CeO2 content over 80%,median particle size D50 less than 1.5 μm.
出处
《稀有金属与硬质合金》
CAS
CSCD
2003年第3期1-4,共4页
Rare Metals and Cemented Carbides
基金
国家自然科学基金资助项目(20163002)
南昌大学"211工程"示范项目资助
