摘要
DY2001A型电子束曝光机是作为实用化的小型曝光系统而研制的。从设计角度详细阐述了DY2001A型电子束曝光机软件系统的构成,包括数据转换、对准校正套刻、硬件系统控制、曝光控制及数据建立和管理。
DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.The software system of DY2001A EBLS, from the aspect of design, is discussed in detail including data conversion, alignment and overlap, control to hardware, exposure control, data creation and management.
出处
《微细加工技术》
2003年第3期5-8,共4页
Microfabrication Technology
