电子束曝光机静电偏转系统

Electrostatic Deflection System of E-beam Lithography Machine

以静电极板为电子束曝光机偏转负载,用双通道扫描原理进行扫描,并使用计算机辅助设计研究电子束曝光机聚焦偏转系统的结构。由SDS-3电子束曝光机试验结果表明,复合静电偏转可以达到磁偏转相似的像差水平。

Using the electrostatic plates as the load of the Ebeam deflection system and the double channels scanning the structure of the Ebeam column is analyzed with CAD. The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.