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用于测距的掺镱脉冲光纤激光器的输出特性

Output characteristics of pulse ytterbium doped fiber laser for distance measurement
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摘要 研究了用于测距的被动调Q掺镱光纤脉冲激光器的输出特性,仿真对比了可饱和吸收体长度以及增益光纤长度对输出功率的影响.结果表明:在抽运源功率为5 W的条件下,输出脉冲宽度为0.8μs,脉冲峰值功率为26 W,平均功率为2 W,脉冲能量为20μJ.在物体反射率为10%,探测距离为200 m,以及大气透过率为100%的条件下,返回最小功率为3.9×10^(-7) W. In this paper,the output characteristics of passive Q-switched ytterbium doped pulse fiber lasers for distance measurement was studied.Besides,the effects of saturable absorber length and gain fiber length on output power were studied by simulation.Under the condition that the pump source power was 5 W,the simulation results showed that the output pulse width was 0.8 μs,the pulse peak power was 26 W,the average power was 2 W and the pulse energy was 20 μJ.When the object reflectivity was 10%,and when the detection distance was 200 m,and when the atmospheric transmittance was 100%,the minimum power returned was 3.9×10-7 W.
作者 张义冬 武向农 ZHANG Yidong;WU Xiangnong(College of Information,Mechanical and Electrical Engineering,Shanghai Normal University,Shanghai 200234,China)
出处 《上海师范大学学报(自然科学版)》 2019年第1期91-95,共5页 Journal of Shanghai Normal University(Natural Sciences)
关键词 光纤脉冲激光器 测距 被动调Q pulse fiber laser distance measurement passive Q-switched
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  • 1邓国庆,余吟山,朱志强.准分子激光放电回路的研究[J].量子电子学报,2004,21(4):456-458. 被引量:6
  • 2楼祺洪.准分子激光器的发展和应用[J].中国激光,1994,21(5):361-364. 被引量:13
  • 3甘德昌.热电探测器对辐射功率的响应[J].物理学报,1995,44(1):137-141. 被引量:2
  • 4Gillespie W D,Ishihara T,Partlo W N,et al.6 kHz MOPA light source for 193 nm immersion lithography[C].Optical Microlithography XVIII[M].2005,SPIE 5754,Part 3,1293-1303.
  • 5Stamm U,Paetzel R,Bragin I,et al.High repetition rate ultra-narrow bandwidth 193 nm excimer lasers for DUV lithography[C].Optical Microlithography XIII[M].2000,SPIE,4000,1390-1396.
  • 6Huber H,Pflanz T,GSrtler A,et al.High repetition rate compact excimer laser:UV light source for metrology,inspection,direct writing and material testing[C].Emerging Lithography Technologies VII,5037 II,1092-1099.
  • 7Ophir Optronics Inc.Standard Pyroelectvic OEM Heads-Introduction[Z].http://www.ophiropt.com.
  • 8Bielecki Z,Chmielewski K,Nowakowski M,et al.Microprocessor energy meter of laser radiation[C].SPIE,1995,2202:322.
  • 9Chang P Y,Chou H P.A high precision peak detect sample and hold circuit[C].2006 IEEE Nuclear Science Symposium Conference Record,USA:IEEE Piscataway NJ USA,2006.
  • 10巩岩,张巍.193nm光刻曝光系统的现状及发展[J].中国光学与应用光学,2008,1(1):25-35. 被引量:21

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