WO_3电致变色薄膜制备过程中光学膜厚测量监控技术的研究

The study on optical film thickness measure and control technology during the preparation of WO_3 electrochromic thin films

采用真空电子束蒸发方法制备 WO3电致变色薄膜过程中 ,利用极值法光学膜厚测量技术监控薄膜的光学特性 ,对不同光学膜厚的 WO3薄膜的原始态、着色态和退色态的光谱特性进行了对比分析。测试采用二电极恒电压方法 ,用分光光度计实时测量透过率的变化。结果证明以 ITO玻璃作为比较片 ,极值法监控薄膜光学膜厚 ,当反射率达到第一极小值 ,即透过率达到第一极大值时 。

The extremum method of optical film thickness measure technology has been used to control the optical properties of WO_3 electrochromic thin films, which were prepared by vacuum electron beam evaporation. The spectrum characters of as-grown, colored and bleached WO_3 eletrochromic thin films with different optical film thickness were contrasted. The changes of transmittance were real-time measured by spectrophotometer within two-electrode cell. The results show that the WO_3 thin films would take on the best electrochromic characters when the reflectance obtains the first minimum, viz., the transmittance obtains the first maximum, by using extremum method with ITO comparison glass to control the film thickness.