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高质量金刚石膜在无氧铜衬底上的MPCVD 被引量：6

Growth of High Quality Diamond Films on Cu Metal Substrates by MPCVD
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摘要 本文采用高纯无氧铜 (Cu)片作为基片 ,用自行设计的微波等离子体化学气相沉积系统 ,制备出了高质量多晶金刚石膜。用场发射扫描电子显微镜 (SEM)、Raman散射谱和X射线衍射谱 (XRD)对制备的金刚石膜进行了表征与分析 ,其结果证明金刚石膜具有较优的质量。 High quality polycrystalline diamond films were deposited on Cu metal substrates by microwave plasma chemical vapor deposition (MPCVD) system. The samples obtained under different CH_4 concentration were characterized by high resolution scanning electron microscopy, Raman scattering spectroscopy and X-ray diffraction.The results show that the quality of diamond film prepared by the method is high.
作者 常开朋 程文娟 江锦春 张阳 朱鹤孙 沈德忠
机构地区 清华大学化学系
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2003年第4期382-385,共4页 Journal of Synthetic Crystals
关键词 质量 金刚石膜 无氧铜 衬底 MPCVD 微波等离子体化学气相沉积 表征 diamond films Cu substrate MPCVD
分类号 O484.1 [理学—固体物理]
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参考文献8

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同被引文献38

  • 1张文军,张仿清,胡博,韩立,陈光华.用微波等离子体化学气相沉积(MWCVD)法在(100)Si衬底上沉积织构金刚石膜[J].科学通报,1994,39(23):2203-2203. 被引量：2
  • 2孙亦宁,郭晓土,李敬起.微波等离子体化学气相沉积金刚石簿膜[J].真空与低温,1994,13(4):198-200. 被引量：1
  • 3蔡杰,李包顺,庄汉锐,郭景坤.微波等离子体技术在高技术新材料领域的应用[J].材料导报,1995,9(2):29-31. 被引量：4
  • 4胡海天,邬钦崇,盛奕建.微波等离子体化学气相沉积金刚石膜[J].物理,1996,25(11):688-696. 被引量：8
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  • 9Chen L C, Bhusari D M, YangCY, Chen K H, ChuangTJ, Lin M C, ChenC K, Huang Y F. Si-containing Crystalline Carbon Nitride Derived from Microwave Plasma-enhanced Chemical Vapor Deposition [J]. Thin Solid Films, 1997, 303:66.
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引证文献6

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人工晶体学报
2003年 第4期

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