电镀法制备CoNi_(1-x)Nd_xMnP永磁薄膜阵列的研究

Preparation of CoNi_(1-x)Nd_xMnP Permanent Film Arrays by Electroplating

为了提高永磁薄膜阵列的剩磁和最大磁能积 ,在电镀制备CoNiMnP永磁薄膜阵列过程中引入少量稀土Nd原子替代部分Ni原子 ,采用光刻和电镀技术在 5mm× 5mm× 0 .2mm的硅片上设计并制备了 2 0 0 0个大小为 5 0 μm× 5 0 μm的CoNi1 -xNdxMnP垂直各向异性永磁薄膜阵列 ,并对该薄膜陈列的组成、磁性能等进行了分析与测试。结果表明 :薄膜阵列的组成为 (质量分数 ) :Nd 1.90 % ,Co 86.62 % ,Ni 5 .68% ,Mn2 .0 6% ,P 3 .74% ;阵列垂直方向磁性能为 :Hc=5 9.7kA·m- 1 ,Br=0 .5 3T ,(BH) max=11.3kJ·m- 3;阵列水平方向磁性能为 :Hc=2 7.8kA·m- 1 ,Br=0 .42T ,(BH) max=3 .2kJ·m- 3。

For enhancing the remanence and maximum energy density of permanent magnet films, neodymium was introduced in electroplating CoNiMnP permanent magnet films. The microstructure, material composition and magnetic performances of the deposited films were tested and analyzed. The results show that high magnetic performances CoNi 1-x Nd x MnP permanent magnet films with vertical anisotropy can be fabricated with current density less than 10 mA·cm -2 at room temperature. The deposited film composition is as follows: Nd 1.90%, Co 86.62%, Ni 5.68%, Mn 2.06%, P 3.74% (mass fraction). The vertical direction magnetic parameters are H c=59 7 kA·m -1 , B r=0.53 T, ( BH ) max =11.3 kJ·m -3 , while H c=27.8 kA·m -1 , B r=0.42 T, ( BH ) max =3.2 kJ·m -3 . in the lateral direction.