基于有限状态机模型的光刻版图自动布局系统

Pattern automatic placement system for photomask based on FSM model

采用有限状态机模型设计了集成电路光刻版上各个图形布局的自动系统。将布局的各个阶段定义为不同的状态,布局规则定义为触发条件,组成一个有限状态机。基于此模型的计算机自动布局系统能自动完成图形在光刻版上的布局,充分利用硅圆片面积并给出布局报告。

A computer-aid pattern automatic placement system is designed based on the finitestate machine model. The individual processes of placement are defined as different status while theplacement rules are regarded as trigger conditions, which determines a finite state machine. Thecomputer-aided placement system based on this model can finish the placement automatically, utiliz-ing the wafer area as much as possible and the placement report can be generated sequentially.