摘要
熔融图形化的光刻胶是三维曲面微结构加工的常用方法,但是,一次成型的熔胶工艺制作的弯曲面曲率半径较小,为此我们提出了一种借助二次熔胶工艺实现微弯曲面成型的新工艺—多线成面技术。此方法工艺简单,一般具备光刻条件的实验室就能够实现,与传统工艺兼容性好,用它制作的弯曲面可以与灰阶掩膜光刻相比拟,介绍了该工艺的原理和特点。
In general,Melting photoresist is one of microfabrication tecniques to produce 3-D microstrutures,but it can't fabricate micro-bulking surfaces with a large radius of curvature.Hence,combinating it with coating photoresist technique,we have presented a novel technique,forming surfaces with a series of lines,to solve this problem.It is a low cost and convenience technique to fabricate arbitrary micro-structures.The principle is described and experimental results are studied in detail.
出处
《电子工艺技术》
2003年第5期210-213,共4页
Electronics Process Technology
基金
国防重点实验室基金项目(5148502030)
电科院预研课题(024130805)。
关键词
高深宽比光刻胶结构
熔融成型
二次涂胶定型
微弯曲面
任意形状表面
High aspect ratio photoresist structures
Melting photoresist
Second coating phothoresist
Micro-buckling surfaces
Arbitrary surfaces