一种大面积二维石英纳米结构制备的工艺研究

Research on fabricating technology a large area of nanodot arrays on quartz

介绍一种采用紫外(363.8nm)激光干涉光刻得到大面积二维纳米点阵结构的方法,该技术具有操作简单、光路搭建成本低、可以大面积加工微纳图形结构等优点;并利用等离子体刻蚀传递,获得周期为200nm的二维石英纳米点阵结构。通过光刻工艺与反应离子束刻蚀工艺的优化,得到加工二维石英点阵的最优制备工艺。利用扫描电子显微镜(SEM)与原子力显微镜(AFM)对制备二维纳米图形结构进行表征与分析,并利用紫外可见光分光光度计对制备的二维点阵结构图形进行紫外透过率测试,发现加工的二维结构在365nm处的透过率仍大于90%,符合紫外固化纳米印掩模板对紫外光高透过率的要求。

In this paper,making a large area Nano dot arrays on quartz with laser interference photolithography which possesses the advantages of operating simply,low cost and fabricating a large area nanopatterns combined with the dry etching technology.Finally,obtained 200 nm period of quartz nano dot array.Through optimization of the photolithography process and reactive ion beam etching process,obtaining the optimal parameters for fabricating the dot arrays.The surface morphology of photoresist pattern and etched patterns was observed by scanning electron microscope(SEM)and atomic force microscope(AFM),The UV transmittance properties of the templates were measured by a scanning spectrophotometer.The results demonstrate that the UV transmittance of the etched template is still over 90% at the wavelength of 365 nm.