一种新型的锥尖制作方法研究

Study on a Novel Method of Forming Silicon Tip

主要介绍利用反应离子腐蚀和等离子腐蚀相结合的方法制作真空微电子压力传感器中锥尖阵列。探讨合理选择制作材料,优化锥尖形状,锐化锥尖尖度,以提高传感器灵敏度,增大阴极锥尖的发射电流。测试结果表明:优化的锥尖发射电流在电压为3V时可达0.2nA,灵敏度为0.1μA/g。

A new way of using reactive ion etch and plasma etch to make sharptips for vacuum pressure sensor is presented in this paper.In addition,to improve sensitivity and enlarge silicontips emit current, siliontip's material choose,shape optimization,virtual process fabrication are studied.The measurement results show that the emitting current of one sharp tip is 02 nA at 3 V,and the sensitivity reach 01 μA/g.