霍尔源用于光学镀膜

Hall Ion Source for Thin-film Coatings

报道了用于辅助镀膜的无栅霍尔等离子体源的结构原理及性能指标 ,并从光学特性、显微特性和机械特性三方面着手 ,研究了使用霍尔源所做的单层TiO2 膜的成膜工艺与质量 研究表明 ,使用霍尔源辅助沉积的光学薄膜折射率明显提高 ,更加接近于块状材料 ,膜层结构比传统沉积手段更加致密 ,附着力也很高 同时用此项技术沉积了金属增强反射镜 ,试验结果与理论设计结果相符 。

The theory and properties of End-Hall ion source are reported. The research to the quality and productive technology of TiO 2 coatings that are produced by using Hall ion source is made in three respective properties including optical property, micro-structure, and mechanism property. The research shows that the index of optical coating increases remarkably by using plasma ion assisted deposition and approaches to the massive material further, the coating structure is more compacted than the one obtained through conventional deposition method and the adhesive power is high as well. Meantime an enhanced metal reflector is produced through this technique and the subsequent result of experiment is in accordance to the one designed, finally the objective of the design is met.