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铝单晶中位错交割过程的分子动力学模拟 被引量:3

MOLECULAR DYNAMICS SIMULATION OF INTERSECTION OF DISLOCATIONS IN ALUMINUM
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摘要 利用EAM势对含160万个原子的Al单晶中位错的交割过程进行了分子动力学模拟.结果表明,当处在不同滑移面上的两个位错相交后,有可能产生1/3空位或1/3间隙原子,它们是晶体中的最小点缺陷,可作为相交位错的节点而单独存在.也可由1/3空位列或1/3间隙原子构成扩展割阶.不同类型的位错相交后,在运动位错的后面可留下一列空位或一列间隙原子,但也可能不留下点缺陷. The molecular dynamics method is used to simulate intersection of dislocations in aluminum containing 1.6 x 10(6) atoms by EAM potential. The results show that after the intersection of dislocations located on different slip planes, one-third vacancy or one-third interstitial can be generated, which is the smallest point defect in the crystal instead of unit vacancy or interstitial. The one-third vacancy or one-third interstitial can exist alone as a constriction of the intersection of dislocations; or a row of one-third vacancies or one-third interstitials composing an extended jog. Depending upon the type of the intersected dislocations there could be a trail of vacancies, interstitials, or nothing behind the moving dislocation.
出处 《金属学报》 SCIE EI CAS CSCD 北大核心 2003年第10期1099-1104,共6页 Acta Metallurgica Sinica
基金 国家重点基础研究发展规划项目G19990650 国家自然科学基金项目10272020资助
关键词 分子动力学模拟 AL 位错交割 1/3空位 1/3间隙原子 molecular dynamics simulation aluminum dislocation intersection one-third vacancy or interstitial
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参考文献9

  • 1Hoagland R G, Daw M S, Hirth J P. J Mater Res, 1991;6:2565.
  • 2Li S, Gao K W, Qiao L J, Zhou F X, Chu W Y. Comput Mater Sci, 2001; 20:143.
  • 3Bulator V, Abraham F F, Kubin L, Devincre B, Yip S. Nature, 1998; 391:669.
  • 4Zhou S J, Preston D L, Lomdahl P S, Beazley D M. Science, 1998; 279:1417.
  • 5Swaminarayan S, Lesar R, Lomdahl P, Beazley D. J Mater Res, 1998; 13:3478.
  • 6Veffe T, Rasmussen T, Leffers T, Pedersen O B, Jacobsen K W. Phys Rev Lett, 2000; 85:3866.
  • 7Johnson R A. Phys Rev, 1988; B37:3924.
  • 8Rapaport D C. The Art of Molecular Dynamics Simulation (Cambridge: Cambridge University Press, 1995).
  • 9Hirth J P, Lothe J. Theory of Dislocations, Wiley, New York, 1982.

同被引文献32

  • 1G.H. Yu, M.H Li, F. W Zhu, X.F. Cui and J.L. Jin ( Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083, China) ( State key laboratory for Advanced Metals and Materials, University of Science and Technology Beijing.INTERFACE REACTION IN MAGNETIC MULTILAYERS[J].Acta Metallurgica Sinica(English Letters),2001,14(6):479-484. 被引量:47
  • 2张克实.多晶体变形、应力的不均匀性及宏观响应[J].力学学报,2004,36(6):714-723. 被引量:19
  • 3邓运来,张新明,唐建国,刘瑛,陈志永,周卓平.多晶纯铝轧制变形晶粒局部取向的演变[J].金属学报,2005,41(5):477-482. 被引量:8
  • 4郭乃国,罗新民,花银群.激光冲击处理对金属微结构及其性能的影响[J].材料导报,2006,20(6):10-13. 被引量:19
  • 5Bolkhovityanov Y B,Pchelyakov O P,Sokolov L V,Chikichev S I.Artificial GeSi substrates for heteroepitaxy:achievements and problems[J].Semiconductors,2003,37:493
  • 6Hornstra J.Dislocations in diamond lattice[J].J.Phys.Chem.Solids.,1958,5:129
  • 7Hirth J P,Lothe J.Theory of Dislocations[M].London:McGRAW-HILL,1968.353
  • 8Koizumi H,Kamimura Y,Suzuki T.Core structure of a screw dislocation in a diamond-like structure[J].Phil.Mag.,2003,A80:609
  • 9Wei C,Bulatov V V,Justo J F,et al.Intrinsic mobility of a dissociated dislocation in silicon[J].Phys.Rev.Lett.,2000,84:3346
  • 10Arias T A,Joannopoulos J D.Ab initio theory of dislocation interactions:from close-range spontaneous annihilation to long-range continuum limit[J].Phys.Rev.Lett.,1994,73:680

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